Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical oxide removal of plasma damaged SiCOH low k dielectrics

Chemical oxide removal of plasma damaged SiCOH low k dielectrics

US Patent 7368393 · Granted May 6, 2008

Estimated economic value: $12,943,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Voltage contrast inspection of deep trench isolation2016
Voltage contrast inspection of deep trench isolation2015
Lateral epitaxial grown SOI in deep trench structures and methods of manufacture2014
Polysilicon/metal contact resistance in deep trench2014
Lateral epitaxial grown SOI in deep trench structures and methods of manufacture2014
Polysilicon/metal contact resistance in deep trench2014
Apparatus and method for programming an electronically programmable semiconducto2013
Lateral epitaxial grown SOI in deep trench structures and methods of manufacture2012
Chemical oxide removal of plasma damaged SiCOH low k dielectrics2012
Chemical oxide removal of plasma damaged SiCOH low k dielectrics2012
Chemical oxide removal of plasma damaged SiCOH low k dielectrics2012
Structure of an apparatus for programming an electronically programmable semicon2010