Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for process monitoring and control

Method and apparatus for process monitoring and control

US Patent 7355171 · Granted Apr 8, 2008

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Neutral beam etching of Cu-containing layers in an organic compound gas environm2018
Post deposition plasma cleaning system and method2015
Method and system for etching high-k dielectric materials2010
Glass powders, methods for producing glass powders and devices fabricated from s2009
Apparatus and method for use of optical system with a plasma processing system2009
Plasma etching of Cu-containing layers2009
Anisotropic dry etching of Cu-containing layers2007
Method and system for etching high-k dielectric materials2007
Process monitoring using infrared optical diagnostics2006
Method of using a sensor gas to determine erosion level of consumable system com2006
Monitoring erosion of system components by optical emission2005
Glass powders, methods for producing glass powders and devices fabricated from s2005