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Home › Lithographic apparatus, device manufacturing method, and method for determining z-displacement

Lithographic apparatus, device manufacturing method, and method for determining z-displacement

US Patent 7352472 · Granted Apr 1, 2008

Estimated economic value: $1,451,000 ⓘ

Assignee

Asml Netherlands B.V.

Inventors

Edwin Eduard Nicolaas Josephus Krijnen (4 patents)

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