{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Utilizing an integrated plasmon detector to measure a metal deposit roughness on a semiconductor surface", "item": "https://www.patentleaderboard.com/patent/7297966"}]}
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Home › Utilizing an integrated plasmon detector to measure a metal deposit roughness on a semiconductor surface

Utilizing an integrated plasmon detector to measure a metal deposit roughness on a semiconductor surface

US Patent 7297966 · Granted Nov 20, 2007

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