Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and systems for conditioning planarizing pads used in planarizing substrates

Methods and systems for conditioning planarizing pads used in planarizing substrates

US Patent 7235000 · Granted Jun 26, 2007

Estimated economic value: $1,771,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wafer storage devices configured to measure physical properties of wafers stored2025
Methods and tools for controlling the removal of material from microfeature work2011
Methods and tools for controlling the removal of material from microfeature work2009
Methods and systems for planarizing microelectronic devices with Ge-Se-Ag layers2008
Retaining rings, and associated planarizing apparatuses, and related methods for2008
Retaining rings, and associated planarizing apparatuses, and related methods for2008
Methods and systems for conditioning planarizing pads used in planarizing substr2008
Systems and methods for monitoring characteristics of a polishing pad used in po2007
Planarizing solutions including abrasive elements, and methods for manufacturing2007
Methods and systems for conditioning planarizing pads used in planarizing substr2007
Methods and systems for conditioning planarizing pads used in planarizing substr2007
Carrier assemblies, planarizing apparatuses including carrier assemblies, and me2006