Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Poly/silicide stack and method of forming the same

Poly/silicide stack and method of forming the same

US Patent 7151048 · Granted Dec 19, 2006

Estimated economic value: $5,419,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Polarization resistant solar cell design using an oxygen-rich interface layer2015
Quality control process for UMG-SI feedstock2013
Bifacial solar cells with back surface doping2013
Bifacial solar cells with overlaid back grid surface2012
Gate stack having nitride layer2011
Seed layer for reduced resistance tungsten film2010
Method for cleaning a gate stack2008
Method of patterning elements within a semiconductor topography2008
Increasing self-aligned contact areas in integrated circuits using a disposable 2008
Method of selective tungsten deposition on a silicon surface2008
Nitride layer on a gate stack2007
Selective oxidation of gate stack2007