Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Effective photoresist stripping process for high dosage and high energy ion implantation

Effective photoresist stripping process for high dosage and high energy ion implantation

US Patent 7144673 · Granted Dec 5, 2006

Estimated economic value: $5,687,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pharmaceutical combinations for treating tumor comprising anti-CD19 antibody and2025
Deep trench isolation structures resistant to cracking2025
Chimeric antigen receptor and natural killer cells expressing same2025
CLDN18.2-targeting antibody, bispecific antibody and use thereof2025
Semiconductor structure and method of manufacturing the same2025
Fuel cell aging prediction method, system thereof, medium and product2025
Convexity adjusting mechanism for working roll of straightening machine2025
Non-woven fabric separation membrane and preparation method and use thereof2025
LDMOS device having isolation regions comprising DTI regions extending from a bo2025
Silicon-based negative electrode material, preparation method and use thereof2025
Semiconductor device and semiconductor die2025
Composite material, preparation method thereof and lithium ion battery2025