Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Two-step GC etch for GC profile and process window improvement

Two-step GC etch for GC profile and process window improvement

US Patent 7049245 · Granted May 23, 2006

Estimated economic value: $164,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Sensor-based privacy-event detection for a mounted electronic device2025
Security camera with angled cable attachment for increased downward-viewing angl2024
Object table comprising an electrostatic clamp2024
Thermal-control system for a security camera and associated security camera2023
Object table comprising an electrostatic clamp2023
Laminate circuit board with a multi-layer circuit structure2014
Method for inhibiting growth of nickel-copper-tin intermetallic layer in solder 2012
Dynamically configuring, allocating and deploying computing systems2010
Managing terminal services accounts and sessions for online utilization of a hos2009
Golf club head having a complex plate formed with an upraised protrusion structu2008
System and method for performing remote tracking and reporting of computing syst2008
Method of forming semiconductor device with non-conformal liner layer that is th2005