Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for monitoring and/or controlling the status of a plasma in a plasma spectrometer and spectrometer for implementing such a method

Method for monitoring and/or controlling the status of a plasma in a plasma spectrometer and spectrometer for implementing such a method

US Patent 6943879 · Granted Sep 13, 2005

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Light-source unit, measurement apparatus, near-infrared microscopic apparatus, o2021
Method and apparatus for measuring gel particle2020
Light-source unit, measurement apparatus, near-infrared microscopic apparatus, o2020
Substrate for surface enhanced Raman scattering spectroscopy and devices using s2019
Optical analyzer and wavelength stabilized laser device for analyzer2015
Refined oil degradation level measuring instrument and refined oil degradation l2014
Device and method for spectroscopic measurement with an imaging device comprisin2007
Combustion furnace system for analyzing elements in a sample2003
Analytical method for multi-component aqueous solutions and apparatus for the sa1999
Apparatus for determining kinds of adsorbates1999
Method and apparatus for determining a peak position of a spectrum1998
Wavelength-scanning mechanism and method for spectrometer1998