Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sputtering source for ionized physical vapor deposition of metals

Sputtering source for ionized physical vapor deposition of metals

US Patent 6929720 · Granted Aug 16, 2005

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Point-of-use enrichment of gas mixtures for semiconductor structure fabrication 2019
Lithium ion battery and method for manufacturing of such battery2015
Fuel cell/supercapacitor/battery power system for vehicular propulsion2014
Method for fabricating a supercapacitor electronic battery2014
Integrated electrochemical and solar cell2014
Conductive seal ring electrostatic chuck2012
Vacuum-processing chamber-shield and multi-chamber pumping method2006
Ionized PVD with sequential deposition and etching2004
Method and apparatus for ionized physical vapor deposition2004
Reduced edge contact wafer handling system and method of retrofitting and using 2004
Inductively-coupled plasma processing system2003
Immersed inductively—coupled plasma source2002