Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sidewall smoothing in high aspect ratio/deep etching using a discrete gas switching method

Sidewall smoothing in high aspect ratio/deep etching using a discrete gas switching method

US Patent 6924235 · Granted Aug 2, 2005

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for plasma dicing a semi-conductor wafer2025
Electrostatic discharge prevention in ion beam system2025
Inflation device with toggle-locking trigger2024
Protective coating for plasma dicing2024
Ion filter using aperture plate with plurality of zones2023
Method and apparatus for plasma dicing a semi-conductor wafer2023
Protective coating for plasma dicing2023
Method and apparatus for plasma dicing a semi-conductor wafer2022
High-pressure syringe with pressure reduction2021
Method for dicing die attach film2021
Method and apparatus for plasma dicing a semi-conductor wafer2020
Method and apparatus for plasma dicing a semi-conductor wafer2020