Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor device having an insulating layer and method for forming

Semiconductor device having an insulating layer and method for forming

US Patent 6908822 · Granted Jun 21, 2005

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Self-stoking combustion appliance and cookers2021
Method of forming a semiconductor device and semiconductor device2013
Dual interlayer dielectric stressor integration with a sacrificial underlayer fi2012
Method of forming a semiconductor device and semiconductor device2011
Separate layer formation in a semiconductor device2011
Method for forming a through silicon via (TSV)2011
Method of forming a semiconductor layer2011
Trench formation in a semiconductor material2011
Dual substrate orientation or bulk on SOI integrations using oxidation for silic2010
Method to control uniformity/composition of metal electrodes, silicides on topog2009
Semiconductor device with silicided source/drains2007
Semiconductor device incorporating a defect controlled strained channel structur2006