Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polishing pad for a semiconductor device having a dissolvable substance

Polishing pad for a semiconductor device having a dissolvable substance

US Patent 6899611 · Granted May 31, 2005

Estimated economic value: $7,768,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Filter medium for particulate filtration2014
Filter arrangement2012
Apparatus for forming a porous reaction injection molded chemical mechanical pol2009
Method for forming a porous polishing pad2008
Method for forming a porous reaction injection molded chemical mechanical polish2008
Polishing compositions for noble metals2007
Island swim raft2006
Resilient polishing pad for chemical mechanical polishing2006
Method of forming a polishing pad with reduced stress window2006
Polishing pad with high optical transmission window2006
Method of polishing a semiconductor device2005
Method of polishing a semiconductor device2005