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Home › System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position

System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position

US Patent 6888615 · Granted May 3, 2005

Estimated economic value: $4,514,000 ⓘ

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