Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor fabrication process for modifying the profiles of patterned features

Semiconductor fabrication process for modifying the profiles of patterned features

US Patent 6884727 · Granted Apr 26, 2005

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Three-dimensional transistor and methods of manufacturing thereof2017
Three-dimensional transistor and methods of manufacturing thereof2017
Transistors with different threshold voltages2015
Method of forming a semiconductor structure2013
Transistor having gate dielectric protection and structure2012
Method of forming a semiconductor structure2012
Selective uniaxial stress modification for use with strained silicon on insulato2011
CMOS process with optimized PMOS and NMOS transistor devices2011
Pseudo hybrid structure for low K interconnect integration2011
Method of forming a continuous layer of a first metal selectively on a second me2011
Method for forming a transistor having gate dielectric protection and structure2011
Method for transistor fabrication with optimized performance2011