Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of fabricating a narrow polysilicon line

Method of fabricating a narrow polysilicon line

US Patent 6884722 · Granted Apr 26, 2005

Estimated economic value: $8,819,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Edge couplers including a grooved membrane2024
Edge couplers including a rounded region adjacent to an opening in the interconn2023
Dual bond pad structure for photonics2021
Dual bond pad structure for photonics2020
Dual bond pad structure for photonics2019
Photonics chip2019
Integrated circuit including wire structure, related method and design structure2019
Photonics chip2018
Integrated waveguide structure with perforated chip edge seal2018
Integrated circuit including wire structure, related method and design structure2017
Barrier structures for underfill blockout regions2017
Structures for preventing dicing damage2017