Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Alleviating line end shortening by extending phase shifters

Alleviating line end shortening by extending phase shifters

US Patent 6859918 · Granted Feb 22, 2005

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Dynamic updates for the inspection of integrated circuits2020
Correction for flare effects in lithography system2019
Guided defect detection of integrated circuits2018
Lens heating aware source mask optimization for advanced lithography2018
Pattern selection for full-chip source and mask optimization2018
Pattern selection for full-chip source and mask optimization2015
Correction for flare effects in lithography system2014
Method of pattern selection for source and mask optimization2014
Selection of optimum patterns in a design layout based on diffraction signature 2013
Stereo set2013
Pattern selection for full-chip source and mask optimization2013
System and method for creating a focus-exposure model of a lithography process2012