Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming a phase-shifting mask for semiconductor device manufacture

Method for forming a phase-shifting mask for semiconductor device manufacture

US Patent 6767672 · Granted Jul 27, 2004

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods using mask pattern measurements performed with compensated l2022
Apparatus for manufacturing pellicle2021
Systems and methods using mask pattern measurements performed with compensated l2021
Method of manufacturing pellicle and apparatus for assembling pellicle2020
Pellicle for exposure to extreme ultraviolet light, photomask assembly, and meth2019
Method of manufacturing an organic light emitting diode by lift-off2018
Ion sensitive field effect transistor2016
Method of manufacturing OLED-on-silicon2014
Method for manufacturing photomask and photomask manufactured using the same2014
Method of forming photomask using calibration pattern, and photomask having cali2013
Methods of forming semiconductor devices using photolithographic shot grouping2013
Pattern forming method2012