Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method to solve alignment mark blinded issues and a technology for application of semiconductor etching at a tiny area

Method to solve alignment mark blinded issues and a technology for application of semiconductor etching at a tiny area

US Patent 6746966 · Granted Jun 8, 2004

Estimated economic value: $4,610,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Intelligent exercise intensity assessing system and assessing method thereof2025
Voltage stabilizer and power conversion device using same2024
Passive flow modulation device2024
Voltage stabilizer and power conversion device using same2023
Semiconductor structure with ultra thick metal and manufacturing method thereof2023
Wafer debonding and cleaning apparatus2022
Integrated circuit2022
Semiconductor structure with ultra thick metal and manufacturing method thereof2021
Multi-terminal inductor for integrated circuit2020
User interface for accessing hierarchical data2020
Structural determination of carbohydrates using special procedure and database o2020
Multi-terminal inductor for integrated circuit2020