Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and structure for calibrating scatterometry-based metrology tool used to measure dimensions of features on a semiconductor device

Method and structure for calibrating scatterometry-based metrology tool used to measure dimensions of features on a semiconductor device

US Patent 6742168 · Granted May 25, 2004

Estimated economic value: $4,095,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods of calibrating and controlling stepper exposure processes and tools, and2005
Method of monitoring anneal processes using scatterometry, and system for perfor2005
Structures for analyzing electromigration, and methods of using same2005
Method of using scatterometry for analysis of electromigration, and structures f2005
Scatterometry structure with embedded ring oscillator, and methods of using same2004
Method of making a shaped gate electrode structure, and device comprising same2004
Method of measuring implant profiles using scatterometric techniques wherein dis2003
Method of forming silicon oxynitride films2002
Self-aligning silicon oxynitride stack for improved isolation structure2001
Semiconductor device having patterned metal layer over a polysilicon line and me2001
High-reliability damascene interconnect formation for semiconductor fabrication2000
Semiconductor device having self-aligned asymmetric source/drain regions and met2000