{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Lower temperature method for forming high quality silicon-nitrogen dielectrics", "item": "https://www.patentleaderboard.com/patent/6730977"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025

Lower temperature method for forming high quality silicon-nitrogen dielectrics

US Patent 6730977 · Granted May 4, 2004

Estimated economic value: $10,969,000

Assignee

Inventors

View full patent text on Google Patents →