Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for transistor gate formation using gate sidewall implantation

Methods for transistor gate formation using gate sidewall implantation

US Patent 6682994 · Granted Jan 27, 2004

Estimated economic value: $41,018,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integration scheme for changing crystal orientation in hybrid orientation techno2015
Integration scheme for changing crystal orientation in hybrid orientation techno2013
System and method for making photomasks2011
Integration scheme for changing crystal orientation in hybrid orientation techno2011
Methods for transistor formation using selective gate implantation2009
Methods for transistor formation using selective gate implantation2009
Methods for transistor formation using selective gate implantation2009
Integrated circuit containing polysilicon gate transistors and fully silicidized2007
Integrated circuit containing polysilicon gate transistors and fully silicidized2006
Methods for transistors formation using selective gate implantation2006
Methods for transistors formation using selective gate implantation2006
Methods for transistors formation using selective gate implantation2006