Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for the production of process sensitive lithographic features

Method and apparatus for the production of process sensitive lithographic features

US Patent 6673638 · Granted Jan 6, 2004

Estimated economic value: $29,366,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

High-contrast soap film magnification device2015
Active spectral control of optical source2013
Methods and systems for lithography process control2010
Method and apparatus for embedded encoding of overlay data ordering in an in-sit2009
Method and apparatus for measurement of crossfield chromatic response of project2009
Methods and systems for lithography process control2008
Method for process optimization and control by comparison between 2 or more meas2008
Process for determination of optimized exposure conditions for transverse distor2007
Methods and systems for lithography process control2006
Methods and systems for lithography process control2004
Method and structure for suppressing light reflections during photolithography e2001
Chemical gas analysis during processing of chemically amplified photoresist syst1999