Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Device for processing semiconductor wafers

Device for processing semiconductor wafers

US Patent 6607602 · Granted Aug 19, 2003

Estimated economic value: $6,356,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Atomic layer deposition apparatus and method for processing substrates using an 2022
Optical phono cartridge and system2021
Method and apparatus for contactlessly advancing substrates2020
Substrate processing apparatus2020
Atomic layer deposition apparatus and method for processing substrates using an 2020
Floating substrate monitoring and control device, and method for the same2016
Apparatus and method for high-throughput atomic layer deposition2016
Apparatus and method for high-throughput atomic layer deposition2016
Deposition of TiN films in a batch reactor2011
Chemical vapor deposition of TiN films in a batch reactor2010
Parts for deposition reactors2010
In situ silicon and titanium nitride deposition2009