Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical solution and method for reducing the metal contamination on the surface of a semiconductor substrate

Chemical solution and method for reducing the metal contamination on the surface of a semiconductor substrate

US Patent 6592676 · Granted Jul 15, 2003

Estimated economic value: $22,869,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Aqueous solution for etching silicon oxide2022
System for delivering ultrasonic energy to a liquid and use for cleaning of soli2017
Method and apparatus for cleaning semiconductor substrates2016
Substrate treating method and method of manufacturing semiconductor device using2012
Method for removing a hardened photoresist2012
Method and apparatus for controlling optimal operation of acoustic cleaning2012
Method for coating substrates2011
Method for measuring contamination in liquids at PPQ levels2010
Method and apparatus for removing a liquid from a surface of a substrate2009
Semiconductor cleaning solution2009
Method and apparatus for immersion lithography2007
Composition comprising an oxidizing and complexing compound2007