Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Nitride open etch process based on trifluoromethane and sulfur hexafluoride

Nitride open etch process based on trifluoromethane and sulfur hexafluoride

US Patent 6589879 · Granted Jul 8, 2003

Estimated economic value: $32,858,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vapor cleaning of substrate surfaces2025
Film thickness uniformity improvement using edge ring and bias electrode geometr2025
Doping techniques2025
Vapor delivery head for preventing stiction of high aspect ratio structures and/2025
Driving circuit and circuit system thereof2025
Mechanical extension apparatus for extendable seat and extendable seat2024
Electroplating for vertical interconnections2024
Methods for metal oxide post-treatment2024
Organic light emitting display panel and organic light emitting display apparatu2024
Edge ring2024
Methods for calibrating an optical emission spectrometer2024
Three-dimensional superconducting qubit and a method for manufacturing the same2024