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Home › Nitride deposition wafer to wafer native oxide uniformity improvement for 0.35 flash erase performance by adding thermal oxide oxidation process

Nitride deposition wafer to wafer native oxide uniformity improvement for 0.35 flash erase performance by adding thermal oxide oxidation process

US Patent 6541339 · Granted Apr 1, 2003

Estimated economic value: $4,006,000 ⓘ

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