Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cyclosilane compound, and solution composition and process for forming a silicon film

Cyclosilane compound, and solution composition and process for forming a silicon film

US Patent 6503570 · Granted Jan 7, 2003

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Binder composition for electrode of electric storage device2019
Method for forming crystalline cobalt silicide film2017
Method for forming patterned conductive film2016
Charged particle beam apparatus, thin film forming method, defect correction met2016
Container containing a cobalt carbonyl complex and cobalt carbonyl complex compo2015
Method for forming patterned conductive film2014
High order silane composition and method of manufacturing a film-coated substrat2014
Composition and method for forming an aluminum film2013
Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin2011
Trench filling method2010
Composition for forming silicon-cobalt film, silicon-cobalt film and method for 2010
Composition for forming silicon film and method for forming silicon film2009