Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dual work function CMOS device

Dual work function CMOS device

US Patent 6492688 · Granted Dec 10, 2002

Estimated economic value: $205,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integrated circuits and manufacturing methods2002
Reliable polycide gate stack with reduced sheet resistance and thickness2002
Method for forming a high surface area trench capacitor2001
Memory cell having trench capacitor and vertical, dual-gated transistor2001
Method for the fabrication of a doped silicon layer2001
Fabrication of trench capacitors using disposable hard mask2001
Insitu doped metal policide2000
Gapfill of semiconductor structure using doped silicate glasses2000
Low temperature reflow dielectric-fluorinated BPSG2000
Gapfill of semiconductor structure using doped silicate glasses2000
Advanced damascene planar stack capacitor fabrication method2000
Method of planarizing the semiconductor structure1999