Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of detecting film defects using chemical exposure of photoresist films

Method of detecting film defects using chemical exposure of photoresist films

US Patent 6440621 · Granted Aug 27, 2002

Estimated economic value: $1,474,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integrated circuit wafer system with control strategy2012
Methods and systems for controlling resist residue defects at gate layer in a se2004
Chemical mechanical polishing with electrochemical control2004
Electrochemically generated reactants for chemical mechanical planarization2004
Methods and systems for controlling resist residue defects at gate layer in a se2003
Surface plasmon resonance-based endpoint detection for chemical mechanical plana2003
Method and apparatus for detecting ion implant induced defects2003
Ion implanter with multi-level vacuum2001