Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of and apparatus for drying a wafer using isopropyl alcohol

Method of and apparatus for drying a wafer using isopropyl alcohol

US Patent 6430840 · Granted Aug 13, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Energy storage system protection system2022
Apparatus for and method of cleaning substrates2010
Apparatus and method for processing wafers2008
Wafer drying apparatus2008
Wafer drying methods of Marangoni type and apparatus suitable therefor2005
Wet-etching facility for manufacturing semiconductor devices2001
Wet station apparatus having quartz heater monitoring system and method of monit2000
Wet station apparatus having quartz heater monitoring system and method of monit1999
Wafer cassette and cleaning system adopting the same1998