Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Scattered incident X-ray photons for measuring surface roughness of a semiconductor topography

Scattered incident X-ray photons for measuring surface roughness of a semiconductor topography

US Patent 6376267 · Granted Apr 23, 2002

Estimated economic value: $2,653,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Radiation detection systems and methods2023
Fuel cell catalyst regeneration2013
Fuel cell catalyst regeneration2011
Arrayed neutron detector with multi shielding allowing for discrimination betwee2010
Method of forming conductive interconnections on an integrated circuit device2003
Sub-cap and method of manufacture therefor in integrated circuit capping layers2003
System and method for analyzing layers using x-ray transmission2002
Sub-cap and method of manufacture therefor in integrated circuit capping layers2002
Interlayer between titanium nitride and high density plasma oxide2001
Nitride based sidewall spaces for submicron MOSFETs2001
Thin titanium film as self-regulating filter for silicon migration into aluminum2001
Depth profile metrology using grazing incidence X-ray fluorescence2001