Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Magnification and rotation calibration patterns for particle beam projection system

Magnification and rotation calibration patterns for particle beam projection system

US Patent 6320187 · Granted Nov 20, 2001

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Lithography tool image quality evaluating and correcting2008
Lithography tool image quality evaluating and correcting2005
Precision high speed magnetic coil driver circuit2002
Compensation of space charge in a particle beam system2001
Measurement marks for e-beam projection mask and method of using2000
Method for monitoring resist charging in a charged particle system1998
Calibration patterns and techniques for charged particle projection lithography 1998
Hardware/software implementation for multipass E-beam mask writing1997
Electron beam nano-metrology system1996
Registration and alignment technique for X-ray mask fabrication1996
Pseudo-random registration masks for projection lithography tool1996
Registration of patterns formed of multiple fields1994