Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming silicide regions on an integrated device

Method for forming silicide regions on an integrated device

US Patent 6297135 · Granted Oct 2, 2001

Estimated economic value: $5,047,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Touchless plumbing control system2025
Management and monitoring of delegated scope on devices2025
Built-in self-test enhancements2025
Using a digital badge to access managed devices2025
Multi-mode support for a launcher2025
Systems for generating indications of relationships between electronic documents2025
Self-radiated loopback test procedure for millimeter wave antennas2024
Device enrollment in a unified endpoint management system over a closed network2024
Managing deployment model migrations for enrolled devices2024
Device to device migration in a unified endpoint management system2024
Dynamic application-level compliance enforcement2024
Stylistic text rewriting for a target author2024