Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for determining ultra shallow junction dosimetry

Method for determining ultra shallow junction dosimetry

US Patent 6288405 · Granted Sep 11, 2001

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for suppressing the channeling effect in high energy deep w2004
Ion implantation with improved ion source life expectancy2004
Method for ultra thin resist linewidth reduction using implantation2003
XE preamorphizing implantation2003
Method of inhibiting lateral diffusion between adjacent wells by introducing car2003
Non-uniform channel profile via enhanced diffusion2003
Method and apparatus for suppressing the channeling effect in high energy deep w2002
Minimized contamination of semiconductor wafers within an implantation system2002
Flash memory erase speed by fluorine implant or fluorination2002
Semiconductor with laterally non-uniform channel doping profile and manufacturin2002
Resist removal by polishing2001
Method for preparing narrow photoresist lines2001