Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Modified material deposition sequence for reduced detect densities in semiconductor manufacturing

Modified material deposition sequence for reduced detect densities in semiconductor manufacturing

US Patent 6270580 · Granted Aug 7, 2001

Estimated economic value: $4,984,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Virtual processing unit scheduling in a computing system2025
Rate proportional scheduling to reduce packet loss in virtualized network functi2025
Memory-aware request placement for virtual GPU enabled systems2025
Method for automated query language expansion and indexing2025
Real-time power meter for optimizing processor power management2024
Network function placement in vGPU-enabled environments2024
Method for automated query language expansion and indexing2024
GPU-remoting latency aware virtual machine migration2024
Workload placement for virtual GPU enabled systems2023
Method for automated query language expansion and indexing2023
Method for automated query language expansion and indexing2023
Method and system for assigning a virtual machine in virtual GPU enabled systems2023