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Home › Method of removing plasma etch damage to pre-silicidized surfaces by wet silicon etch

Method of removing plasma etch damage to pre-silicidized surfaces by wet silicon etch

US Patent 6268285 · Granted Jul 31, 2001

Estimated economic value: $5,560,000 ⓘ

Assignee

AMD

Inventors

Steven C. Avanzino (127 patents)
Susan H. Chen (22 patents)

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