Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of detecting defects in patterned substrates

Method of detecting defects in patterned substrates

US Patent 6252412 · Granted Jun 26, 2001

Estimated economic value: $54,014,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Controlling an intensity profile of an energy beam in additive manufacturing bas2019
Controlling an intensity profile of an energy beam with a deformable mirror in a2019
Extreme ultraviolet (EUV) substrate inspection system with simplified optics and2018
High current electron beam inspection2009
Method and apparatus for multiple charged particle beams2007
Detection of defects in patterned substrates2007
Detection of defects in patterned substrates2007
Method and apparatus for multiple charged particle beams2006
Detection of defects in patterned substrates2005
Detection of defects in patterned substrates2005
Voltage contrast method and apparatus for semiconductor inspection using low vol2003
Feature-based defect detection2003