Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for patterning a photoresist

Method for patterning a photoresist

US Patent 6218082 · Granted Apr 17, 2001

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device, memory system and method of manufacturing the semiconducto2014
Method for fabricating patterns on a wafer through an exposure process2013
Method for verifying mask pattern of semiconductor device2013
Method for fabricating fine pattern2012
Photomask for forming contact hole in semiconductor device2011
Method for forming patterns using single mask2011
Exposure apparatus having the same ID bias2011
Method for verifying mask pattern of semiconductor device2010
Method of fabricating a semiconductor device2002
Pattern for measuring focus of light exposing apparatus and method thereof2002
Method of manufacturing a halftone phase shift mask1999