Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus for the coating of substrates in a vacuum chamber

Apparatus for the coating of substrates in a vacuum chamber

US Patent 6187160 · Granted Feb 13, 2001

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus for coating substrates using the EB/PVD method2017
Magnetron sputter cathode2014
Machine for coating a substrate, and module2011
Cooled backing plate for a sputtering target, and sputtering target comprising a2011
Method for operating a sputter cathode with a target2009
Apparatus and method for healing a workpiece of metal2004
Apparatus for inductively heating a workpiece2004
Air lock for introducing substrates to and/or removing them from a treatment cha2002
Vacuum treatment system for application of thin, hard layers2001
Vacuum treatment system for application of thin, hard layers2001
Sputtering device with a cathode with permanent magnet system2001
Air lock for introducing substrates to and/or removing them from a treatment cha2001