Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for reducing lateral silicide formation for salicide process by additional capping layer above gate

Method for reducing lateral silicide formation for salicide process by additional capping layer above gate

US Patent 6184117 · Granted Feb 6, 2001

Estimated economic value: $1,528,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for fabricating salicide CMOS and non-salicide electrostatic discharge pr2000