Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming rugged polysilicon capacitor

Method for forming rugged polysilicon capacitor

US Patent 6171904 · Granted Jan 9, 2001

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor structure and manufacturing method therefor2025
Method of manufacturing semiconductor structure and semiconductor structure2025
Method for fabricating metal-insulator-metal capacitor2010
Manufacturing method of shallow trench isolation2005
Method of forming a shallow trench isolation structure2004
Trench gate oxide formation method2003
Method of fabricating an oxide/nitride multilayer structure for IC manufacture2002
Method to prevent the formation of a thinner portion of insulating layer at the 2002
Method to prevent the formation of a thinner portion of insulating layer at the 2002
Method to prevent the formation of a thinner portion of insulating layer at the 2002
Method for measuring the parameter of a rough film2001
Method for forming a hemispherical-grain polysilicon2001