Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source

Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source

US Patent 6160621 · Granted Dec 12, 2000

Estimated economic value: $45,743,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Brake master cylinder2025
Laundry washing machine calibration2024
Laundry washing machine color composition analysis during loading2023
Brake master cylinder2022
Laundry washing machine with dynamic selection of load type2022
Methods of and apparatuses for measuring electrical parameters of a plasma proce2015
Methods of and apparatuses for maintenance, diagnosis, and optimization of proce2014
Methods for constructing an optimal endpoint algorithm2013
Methods of and apparatuses for measuring electrical parameters of a plasma proce2011
Apparatus for measurement of parameters in process equipment2010
Sensor apparatus power transfer, communication and maintenance methods and appar2009
Apparatuses for and methods of monitoring optical radiation parameters for subst2009