Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of detecting end point and monitoring uniformity in chemical-mechanical polishing operation

Method of detecting end point and monitoring uniformity in chemical-mechanical polishing operation

US Patent 6153116 · Granted Nov 28, 2000

Estimated economic value: $1,080,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Hair dryer2025
Tablet case2024
Capacitance detection apparatus and earphone2024
Hair dryer2024
Foldable hair dryer2024
Chiller2024
Process for fast dissolution of powder comprising low molecular weight acrylamid2023
System for continuous make-down of powder material2022
Portable electronic apparatus2021
Clamshell electronic device2020
Rapid polymer hydration2020
Continuous production of DMAEA quaternary salts2012