Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of implementing electron beam lithography using uniquely positioned alignment marks and a wafer with such alignment marks

Method of implementing electron beam lithography using uniquely positioned alignment marks and a wafer with such alignment marks

US Patent 6132910 · Granted Oct 17, 2000

Estimated economic value: $59,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electron-beam exposure apparatus and exposure method2000
Electron-beam writing system comprising a second aperture member including at le1999