Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6132910 | Method of implementing electron beam lithography using uniquely positioned alignment marks and a wafer with such alignment marks | — | 2000-10-17 |
| 6114708 | Electron-beam exposure apparatus and exposure method | Ken Tokunaga | 2000-09-05 |
| 5886357 | Electron-beam writing system comprising a second aperture member including at least one rectangular beam-size adjustment aperture | — | 1999-03-23 |