Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Magnetron reactor for providing a high density, inductively coupled plasma source for sputtering metal and dielectric films

Magnetron reactor for providing a high density, inductively coupled plasma source for sputtering metal and dielectric films

US Patent 6132575 · Granted Oct 17, 2000

Estimated economic value: $11,685,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Variable focal length constant magnification lens assembly2008
Detector configuration for interferometric distance measurement2008
Monolithic quadrature detector2008
Wavelength detector2007
Multimode electronic calipers having ratiometric mode and simplified user interf2007
Recessed bonding of target for RF diode sputtering2001
Earmold device2000
Combination mirror and memory switch1999
Switching device with secondary switching function1998
High stability wavefront reference source1994
Achromatic self-referencing interferometer1994
Wavelength meter having single mode fiber optics multiplexed inputs1993