Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6132575 | Magnetron reactor for providing a high density, inductively coupled plasma source for sputtering metal and dielectric films | Mark Feldman | 2000-10-17 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6132575 | Magnetron reactor for providing a high density, inductively coupled plasma source for sputtering metal and dielectric films | Mark Feldman | 2000-10-17 |