Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Technique for fabricating phase shift masks using self-aligned spacer formation

Technique for fabricating phase shift masks using self-aligned spacer formation

US Patent 6103429 · Granted Aug 15, 2000

Estimated economic value: $313,766,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vertically spaced intra-level interconnect line metallization for integrated cir2025
Compositional engineering of Schottky diode2025
Integrated circuit devices with FinFETs over gate-all-around transistors2025
Integrated circuit assemblies with stacked compute logic and memory dies2025
ESD protection decoupled from diffusion2025
Backend electrostatic discharge diode apparatus and method of fabricating the sa2025
Directed self-assembly enabled subtractive metal patterning2025
Contact over active gate structures using directed self-assembly for advanced in2025
Advanced lithography and self-assembled devices2025
Self-aligned patterning with colored blocking and structures resulting therefrom2024
Colored gratings in microelectronic structures2024
Contact over active gate structures with metal oxide-caped contacts to inhibit s2024