Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming semiconductor device with common gate, source and well

Method for forming semiconductor device with common gate, source and well

US Patent 6093609 · Granted Jul 25, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma ignition circuit2022
Plug structure2001
Method of fabricating self-align contact window with silicon nitride side wall2001
Method of fabricating shallow trench isolation structures2000
Method of patterning dummy layer2000
Method of making a low power SRAM1999
Adjustable method for eliminating trench top corners1999
Method of fabricating self-align contact window with silicon nitride side wall1999
Method of fabricating self-align contact window with silicon nitride side wall1998